Thin Film Deposition
Thin film deposition is a process of depositing a thin layer of material onto a substrate. In space and astronautical engineering, thin film deposition is used to create coatings on spacecraft components, such as solar cells, thermal control surfaces, and optical coatings. There are several methods of thin film deposition, including physical vapor deposition (PVD), chemical vapor deposition (CVD), and atomic layer deposition (ALD). PVD involves heating a material until it evaporates and condenses onto the substrate, while CVD involves a chemical reaction between gases that results in the deposition of a solid material. ALD is a more precise method that involves alternating exposure of the substrate to two or more gases, resulting in a highly controlled deposition process. Thin film deposition is critical to the development of advanced spacecraft technologies, as it enables the creation of materials with specific properties, such as high reflectivity, low emissivity, and high durability.
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