Ion Implantation
Ion implantation is a process of introducing ions of a material into another material, typically a semiconductor, to modify its properties. In the context of space and astronautical engineering, ion implantation is used to modify the surface properties of materials used in spacecraft and satellites. This process can improve the material's resistance to radiation damage, increase its hardness, and enhance its electrical conductivity. Ion implantation is also used in the fabrication of solar cells, which are used to power spacecraft. The process involves accelerating ions to high energies and then directing them onto the material's surface. The ions penetrate the material and become embedded in its structure, altering its properties. Ion implantation is a critical technology for the space industry, as it enables the production of materials that can withstand the harsh conditions of space.
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