Plasma Etching
Plasma etching is a process of microfabrication used in the production of integrated circuits, microelectromechanical systems (MEMS), and other microdevices. It involves the use of plasma, a partially ionized gas, to selectively remove material from a substrate. The plasma is generated by applying a high-frequency electric field to a gas, typically a mixture of gases such as oxygen, nitrogen, and hydrogen. The ions and radicals in the plasma react with the substrate, breaking chemical bonds and removing material. Plasma etching is a highly precise and controllable process, allowing for the creation of complex patterns and structures with sub-micron resolution. It is an essential technology in the semiconductor industry and is used in the production of computer chips, sensors, and other electronic devices.
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