Etching
Etching is a process of using chemicals to selectively remove layers of material from a metal surface to create a desired pattern or shape. In space and astronautical engineering, etching is commonly used to create microelectromechanical systems (MEMS) and microfluidic devices. These devices are used in a variety of applications such as sensors, actuators, and lab-on-a-chip systems. Etching can be performed using wet or dry methods, with wet etching being the more common method. Wet etching involves immersing the metal surface in a chemical solution that selectively removes the desired material. Dry etching, on the other hand, uses plasma to remove material from the surface. Etching is a critical process in the fabrication of MEMS and microfluidic devices, as it allows for the creation of complex patterns and shapes at a small scale.
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