EUV Lithography

EUV Lithography is a cutting-edge technology used in the semiconductor industry to create extremely small and precise patterns on silicon wafers. It uses extreme ultraviolet light with a wavelength of 13.5 nanometers to create these patterns, which is much smaller than the wavelength of visible light. The process involves using a series of mirrors and lenses to focus the EUV light onto the wafer, which is coated with a light-sensitive material. The pattern is then etched onto the wafer using a chemical process. EUV Lithography is a critical technology for the development of advanced microprocessors and memory chips, as it allows for the creation of smaller and more complex circuits. However, it is a complex and expensive process that requires specialized equipment and expertise.
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