Chemical Vapor Deposition
Chemical Vapor Deposition (CVD) is a process in which a thin film is deposited on a substrate by introducing a reactive gas or vapor into a reaction chamber. The gas or vapor reacts on the surface of the substrate, forming a solid film. CVD is widely used in the field of space and astronautical engineering for the production of high-performance materials, such as thermal protection systems, optical coatings, and electronic materials. The process can be performed at high temperatures and pressures, allowing for the deposition of materials that are difficult to produce by other methods. CVD is also used for the growth of single-crystal materials, which have unique properties that make them ideal for use in space applications.
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