Plasma Processing

Plasma processing is a technique used in space and astronautical engineering to modify the surface properties of materials. It involves the use of plasma, which is a gas that has been ionized to form a mixture of positively charged ions, negatively charged electrons, and neutral particles. Plasma processing can be used to clean, etch, or deposit thin films on the surface of materials. It is commonly used in the fabrication of microelectronics, such as integrated circuits and solar cells, as well as in the development of thermal protection systems for spacecraft. Plasma processing can also be used to simulate the harsh conditions of the space environment, such as high temperatures and radiation exposure, in order to test the durability of materials and components.
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