Electron Beam Lithography

Electron Beam Lithography (EBL) is a nanofabrication technique that uses a focused beam of electrons to create patterns with sub-10 nm resolution on a substrate. EBL is a key technology for the fabrication of nanoscale devices, such as integrated circuits, sensors, and photonic devices. The process involves the use of a beam of electrons that is focused onto a resist-coated substrate, where the electrons interact with the resist to create a pattern. The resist is then developed to create a mask that can be used for subsequent processing steps, such as etching or deposition. EBL is a complex process that requires specialized equipment and expertise, but it offers unparalleled control over the size and shape of the patterns that can be created.
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